Two heating plates (model KW-4AH from Chemat) are available for soft and hard bake of the photoresist. They offer digital control, temperature inhomogeneity of 5% for wafers up to 6", and can be heated up to 200 ℃. On the right, a spinner from Laurell (model WS-650-23NPP) is used to produce uniform coatings of photoresist over the samples, which can have a size from 1 cm² to 6", with programmable rotation up to 10,000 rpm.