New mask aligner system at LNMS

A new mask aligner, model 206IR from OAI, was recently installed (June 10, 2013) at the New Semiconductor Materials Laboratory (LNMS) of the DFMT.  The system is able to handle 6" wafers and can operate in soft, hard or vacuum mode, using front or backside illumination (with infrared radiation).  It was installed in a clean and yellow room, and will be used for optical lithography with a resolution down to 1 um, in order to process quantum-well and quantum-dot-based optoelectronic devices like infrared photodetectors, solar cells and quantum-cascade lasers.

Desenvolvido por IFUSP